High-Current, Gridless Ion Beam Source for Advanced Thin Film Processing

The Mark II⁺ Ion Source is a production-proven, gridless end-Hall ion source engineered for high-performance thin film processing in optical coating and vacuum deposition systems. Designed to deliver high current density at low ion energies, the Mark II⁺ enables precise control of film properties while maintaining exceptional process stability and repeatability across both R&D and high-throughput manufacturing environments.

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